English Translation

1. Product Overview

The Desktop Magnetron Sputtering Coating System ABN-nanoPVD-S10A is a high-precision thin-film deposition device based on Physical Vapor Deposition (PVD) principle. An inert gas (typically argon) is introduced into the vacuum chamber, where high-density plasma is generated under combined electric and magnetic fields. Ions in the plasma accelerate to bombard the target material, ejecting target atoms that deposit onto the substrate to form uniform and dense thin films. The optimized magnetic field confines electron movement and improves ionization efficiency, enabling stable operation at low air pressure. Featuring a compact structure and user-friendly operation, this system is ideal for research laboratories and small-scale process development.

2. Features

1. Compact benchtop design: Small footprint, easy to install in laboratory environments.

2. High-stability magnetron sputtering structure: Uniform plasma distribution for consistent deposition rate and film quality.

3. Configurable multiple target positions: Supports single-target and dual-target switching to meet the deposition requirements of various materials.

4. Compatibility with multiple power modes: Adaptable to DC and RF sputtering processes.

5. Precise gas and vacuum control: Equipped with Mass Flow Controller (MFC) for excellent process repeatability.

6. Integrated sample stage: Comes with rotation, heating and bias functions to enhance film uniformity.

7. Interlock & safety protection: Multi-layer safety mechanisms including water cooling, vacuum and power supply protection.

8. Modular expandability: Optional add-on modules for reactive sputtering, film thickness monitoring and more.

3. Application Fields

1. Semiconductor & Microelectronics: Deposition of metal electrodes, barrier layers and interconnection thin films.

2. Optics & Optoelectronics: Fabrication of reflective films, transparent conductive films and functional optical coatings.

3. Advanced Materials & Nanotechnology: Research on 2D materials, electrode films and functional thin films.

4. Sensors & Energy Devices: Thin-film preparation for gas sensors, electrochemical devices and energy storage components.

5. Surface Engineering & Functional Coatings: Process development for wear-resistant films, hard coatings and decorative films.

IV. Technical Advantages

1. Superior film quality: Dense coatings with strong adhesion.

2. Excellent film thickness uniformity: Optimized with substrate rotation for outstanding uniformity.

3. Wide process compatibility: Applicable to metals, oxides, nitrides and composite film systems.

4. Low-temperature deposition: Suitable for temperature-sensitive substrates.

5. High process repeatability: Automatic control ensures consistent experimental results.

6. Research-oriented design: Flexible parameter adjustment for process exploration and verification.

V. Technical Specifications

Equipment Application Scenario Diagrams